Titan Deposition With VCE

The production proven Titan Deposition is a loadlocked deposition system with a vacuum cassette elevator. It can be configured for PECVD, HDCVD, PVD, or ALD. The Titan Deposition provides innovative, and leading edge processes in a small footprint at an affordable price.

Standard production processes have been developed for repeatable deposition of SiOx, SiNx, SiC, and a-Si. All backed by over 25 years’ experience in rapid process development.

System Features:

• PLC and touch screen control
• Electrostatic, or mechanical chuck
• Active substrate temperature control
• Vacuum Cassette Elevator
• Optional laser, and optical endpoints