Phantom RIE

The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.

Applications

• MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.

Fluorine Etch Processes(SF6, CF4, CHF3, O2)