Minilock – Phantom DRIE

The Minilock – Phantom RIE is a Reactive Ion Etch system with a vacuum loadlock. The Loadlock allows the main chamber to continue pumping whilst a sample is loaded, or unloaded, and is ideal for toxic gas chemistries.

The system is highly configurable with such options as a ICP, and endpoint.

Applications

• Compound Semiconductor, Failure Analysis, Research & Development, Pilot Line.

Corrosive Chemistry Etch(Cl2, BCl3, SiCl4, HBr, NF3, etc.)